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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Auer, U. Prost, W. Agethen, M. Tegude, F.-J. Duschl, R. Eberl, K. |
| Copyright Year | 1980 |
| Abstract | Si/SiGe interband tunnelling diodes have been grown by MBE on high resistivity (n/sup -/) silicon substrates. The device enables a very low voltage, high-speed logic on a silicon substrate. A novel self-aligned diode is processed using optical lithography and dopant-selective wet chemical etching. A maximum speed index for a 60 /spl mu/m/sup 2/ anode area device is evaluated to 2.2 ns/V resulting in a switching speed of 0.5 ns. A logic latch built of two series connected diodes (MOBILE principle) is demonstrated, showing very robust logic operation at a supply voltage as low as 0.3 V. The used technology may be employed for a co-integration with both SiGe heterostructure bipolar- and field-effect transistor technology and may contribute to future low-voltage high speed logic on Si substrates. |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 215 |
| Ending Page | 217 |
| Page Count | 3 |
| File Size | 209208 |
| File Format | |
| ISSN | 07413106 |
| Volume Number | 22 |
| Issue Number | 5 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2001-05-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Silicon germanium Germanium silicon alloys Logic devices Diodes Low voltage Tunneling Conductivity High speed optical techniques Lithography Chemical processes |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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