NDLI: Investigation of Single and Dual RF Capacitively Coupled Nitrogen Plasma Discharges Using Optical Emission Spectroscopy

Content Provider	IEEE Xplore Digital Library
Author	Akbar, D.
Copyright Year	1973
Abstract	High-resolution optical emission spectroscopy and automated Langmuir probe are applied to examine the production of active species in the pure nitrogen plasma excited by single (40.68 MHz) and dual high-frequency (HF) radio frequency (RF) power sources (40.68/2.1 MHz). The emission intensities of the spectral bands correspond to the (0, 2) transition of the second positive system (SPS) of N₂ (λ =380.50 nm) and (0, 0) transition of the first negative systems (FNSs) of N₂⁺ (λ =391.40 and 427.81 nm have been measured and compared with plasma parameters using the Langmuir probe to investigate the dependence of their radiative states on operating conditions for both single and dual HF RF capacitively coupled plasma (CCP) discharge. It was found that the high power of the low-frequency (LF) source and the gas pressures are the most effective parameters in dual RF CCP discharge system. Thus, both SPS intensity decreases and FNS intensity increases with the increasing LF power at constant pressure. Furthermore, the emission intensity of the first negative band heads increases at least four times in dual RF mode in comparing with the single RF CCP discharge. In contrast, the intensity of the second band heads decreases dramatically to its half values. Likewise, it was found that the transition pressures for the electron heating mode (with increasing the gas pressure) and the transition from α to γ mode (with increasing the RF power) is close to 0.3 torr in single RF mode, but these transitions are about 0.5 torr for dual RF CCP mode.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	2058
Ending Page	2064
Page Count	7
File Size	2074998
File Format	PDF
ISSN	00933813
Volume Number	42
Issue Number	8
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Radio frequency Discharges (electric) Plasmas Fault location Nitrogen Probes single RF CCP. Dual radio frequency (RF) capacitively coupled plasma (CCP) high radio frequency (HF) plasma enhanced chemical vapor deposition (RF-PECVD) Langmuir probe nitrogen band heads optical emission spectroscopy (OES) single RF CCP
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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