NDLI: Effect of the Surface Bond States in as-Deposited DLC Films on the Incorporation of Nitrogen and Oxygen Atoms

Content Provider	IEEE Xplore Digital Library
Author	Nitta, Y. Okamoto, K. Nakatani, T. Shinohara, M.
Copyright Year	1973
Abstract	We have investigated the relation of bonding states in as-deposited diamond-like carbon (DLC) films and the incorporation of N and O atoms into DLC films, following plasma treatment of the surface. After deposition with various coating methods and under different conditions, the DLC films were treated with NH₃ or O₂ plasma. We investigated the changes in bonding states of the films using X-ray photoelectron spectroscopy (XPS). The results suggested that the incorporation due to plasma treatment was affected by the bonding states in the as-deposited DLC films. The C-H/C-C and the sp² C-C/sp³ C-C ratios in the as-deposited DLC films play an important role in controlling N and O incorporation into the DLC films.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	2073
Ending Page	2078
Page Count	6
File Size	320482
File Format	PDF
ISSN	00933813
Volume Number	40
Issue Number	8
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-08-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Surface treatment Plasmas Hydrogen Bonding Radio frequency Films Atomic layer deposition surface structure Diamond-like carbon (DLC) plasma surface treatment
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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