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Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 2009 |
| Description | Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr. |
| File Size | 600699 |
| Page Count | 7 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_20100008508 |
| Archival Resource Key | ark:/13960/t9d55mm5j |
| Language | English |
| Publisher Date | 2009-11-24 |
| Access Restriction | Open |
| Subject Keyword | Nonmetallic Materials Patents Vapor Deposition Vaporizing Methyl Alcohol Plasmas Physics Diamonds Synthesis Chemistry Microwaves Substrates Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Patent |
