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Numerical modeling tools for chemical vapor deposition
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Jasinski, Thomas J. Childs, Edward P. |
| Copyright Year | 1992 |
| Description | Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational fluid dynamics software FLUENT. The resulting software can address general geometries as well as the most important phenomena occurring with CVD reactors: fluid flow patterns, temperature and chemical species distribution, gas phase and surface deposition. The physical models are documented which are available and examples are provided of CVD simulation capabilities. |
| File Size | 3648371 |
| Page Count | 100 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19930006454 |
| Archival Resource Key | ark:/13960/t6rz45x9z |
| Language | English |
| Publisher Date | 1992-12-01 |
| Access Restriction | Open |
| Subject Keyword | Fluid Mechanics And Heat Transfer Vapor Deposition Reactors Computational Fluid Dynamics Temperature Effects Vapor Phases Fluid Flow Flow Distribution Mathematical Models Computerized Simulation Deposition Computer Programs Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |
