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Gas-phase formation of silicon carbides, oxides, and sulphides from atomic silicon ions
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Bohme, Diethard K. Fox, Arnold Wlodek, Stanislaw |
| Copyright Year | 1989 |
| Description | A systematic experimental study of the kinetics and mechanisms of the chemical reactions in the gas phase between ground-state Si(+)2p and a variety of astrophysical molecules. The aim of this study is to identify the reactions which trigger the formation of chemical bonds between silicon and carbon, oxygen and sulphur, and the chemical pathways which lead to further molecular growth. Such knowledge is valuable in the identification of new extraterrestrial silicon-bearing molecules and for an assessment of the gas-phase transition from atomic silicon to silicon carbide and silicate grain particles in carbon-rich and oxygen-rich astrophysical environments. |
| File Size | 231239 |
| Page Count | 6 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19910005701 |
| Archival Resource Key | ark:/13960/t1qg3mb6c |
| Language | English |
| Publisher Date | 1989-12-01 |
| Access Restriction | Open |
| Subject Keyword | Inorganic And Physical Chemistry Silicon Compounds Sulfides Stellar Envelopes Interstellar Chemistry Molecular Clouds Silicon Oxides Vapor Phases Reaction Kinetics Chemical Bonds Silicon Carbides Chemical Reactions Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Article |
