NDLI: Laser annealing of amorphous/poly: silicon solar cell material flight experiment

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Laser annealing of amorphous/poly: silicon solar cell material flight experiment

Content Provider	NASA Technical Reports Server (NTRS)
Author	Cole, Eric E.
Copyright Year	1990
Description	The preliminary design proposed for the microelectronics materials processing equipment is presented. An overall mission profile, description of all processing steps, analysis methods and measurement techniques, data acquisition and storage, and a preview of the experimental hardware are included. The goal of the project is to investigate the viability of material processing of semiconductor microelectronics materials in a micro-gravity environment. The two key processes are examined: (1) Rapid Thermal Annealing (RTA) of semiconductor thin films and damaged solar cells, and (2) thin film deposition using a filament evaporator. The RTA process will be used to obtain higher quality crystalline properties from amorphous/poly-silicon films. RTA methods can also be used to repair radiation-damaged solar cells. On earth this technique is commonly used to anneal semiconductor films after ion-implantation. The damage to the crystal lattice is similar to the defects found in solar cells which have been exposed to high-energy particle bombardment.
File Size	716502
Page Count	31
File Format	PDF
Alternate Webpage(s)	http://archive.org/details/NASA_NTRS_Archive_19910002838
Archival Resource Key	ark:/13960/t9867dt44
Language	English
Publisher Date	1990-06-01
Access Restriction	Open
Subject Keyword	Energy Production And Conversion Solar Cells Crystal Lattices Evaporators Crystallization Amorphous Silicon Microelectronics Thin Films Semiconductors Materials Laser Annealing Orbital Servicing Microgravity Silicon Films Deposition Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science
Content Type	Text
Resource Type	Technical Report

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