NDLI: Vapor phase diamond growth technology

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Vapor phase diamond growth technology

Content Provider	NASA Technical Reports Server (NTRS)
Author	Angus, J. C.
Copyright Year	1981
Description	Ion beam deposition chambers used for carbon film generation were designed and constructed. Features of the developed equipment include: (1) carbon ion energies down to approx. 50 eV; (2) in suit surface monitoring with HEED; (3) provision for flooding the surface with ultraviolet radiation; (4) infrared laser heating of substrate; (5) residual gas monitoring; (6) provision for several source gases, including diborane for doping studies; and (7) growth from either hydrocarbon source gases or from carbon/argon arc sources. Various analytical techniques for characterization of from carbon/argon arc sources. Various analytical techniques for characterization of the ion deposited carbon films used to establish the nature of the chemical bonding and crystallographic structure of the films are discussed. These include: H2204/HN03 etch; resistance measurements; hardness tests; Fourier transform infrared spectroscopy; scanning auger microscopy; electron spectroscopy for chemical analysis; electron diffraction and energy dispersive X-ray analysis; electron energy loss spectroscopy; density measurements; secondary ion mass spectroscopy; high energy electron diffraction; and electron spin resonance. Results of the tests are summarized.
File Size	706183
Page Count	17
File Format	PDF
Alternate Webpage(s)	http://archive.org/details/NASA_NTRS_Archive_19810016430
Archival Resource Key	ark:/13960/t8qc4v26z
Language	English
Publisher Date	1981-01-30
Access Restriction	Open
Subject Keyword	Solid-state Physics Thin Films Crystal Growth Vapor Deposition Spectroscopic Analysis Carbon Ionization Chambers Ion Beams Crystal Structure Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science
Content Type	Text
Resource Type	Technical Report

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