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Apparatus for use in examining the lattice of a semiconductor wafer by x-ray diffraction
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Parker, D. L. |
| Copyright Year | 1978 |
| Description | An improved apparatus for examining the crystal lattice of a semiconductor wafer utilizing X-ray diffraction techniques was presented. The apparatus is employed in a method which includes the step of recording the image of a wafer supported in a bent configuration conforming to a compound curve, produced through the use of a vacuum chuck provided for an X-ray camera. The entire surface thereof is illuminated simultaneously by a beam of incident X-rays which are projected from a distant point-source and satisfy conditions of the Bragg Law for all points on the surface of the water. |
| File Size | 462730 |
| Page Count | 5 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19780017007 |
| Archival Resource Key | ark:/13960/t7rn7zg6h |
| Language | English |
| Publisher Date | 1978-03-07 |
| Access Restriction | Open |
| Subject Keyword | Solid-state Physics X Ray Inspection Nondestructive Tests Deformation Crystal Lattices Semiconductor Devices Semiconductors Materials Wafers X Ray Diffraction Examination Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Patent |
