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Diffusion technique stabilizes resistor values
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 1966 |
| Description | Reduction of the contact resistance stabilizes the values, over a broad temperature range, of resistors used in linear integrated circuits. This reduction is accomplished by p-plus diffusion under the alloyed aluminum contacts. |
| File Size | 78951 |
| Page Count | 1 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19660000141 |
| Archival Resource Key | ark:/13960/t9f52dh3x |
| Language | English |
| Publisher Date | 1966-04-01 |
| Access Restriction | Open |
| Subject Keyword | Electronic Components And Circuits Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |