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Layout Decomposition Approaches for Double Patterning Lithography
| Content Provider | CiteSeerX |
|---|---|
| Author | Kahng, Andrew B. Park, Chul-Hong Xu, Xu Yao, Hailong |
| File Format | |
| Language | English |
| Publisher Institution | Proc. IEEE International Conference on Computer-Aided Design, 2008 |
| Access Restriction | Open |
| Subject Keyword | Different Exposure Process Node Different Color Feasible Dividing Point Layout Decomposition Approach Conflict Cycle Decomposition Approach Key Goal Maximized Overlap Margin Design Rule Violation Pattern Configuration Node Splitting New Graph Integer Linear Programming Pattern Feature Nm Testcases Different Ilp Problem Formulation Layout Feature Minimum Coloring Minimum Coloring Spacing Dpl Coloring Opposite Color Experimental Result Layout Decomposition Double Patterning Lithography Conflict Graph Index Term Double Patterning Lithography |
| Content Type | Text |
| Resource Type | Article |