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Line defect control to maximize yields.
| Content Provider | CiteSeerX |
|---|---|
| Author | Mcnally, Peter Corporation, Intel Mittal, Sanjiv |
| Abstract | This paper discusses line defect control through the use of defect monitors in semiconductor manufacturing. Defect monitor development has focused on maximizing good die output through die yield improvement in a cost-efficient manner. Line defect monitors provide rapid feedback and shorten cycle times for problem resolution. For high-volume manufacturing, line defect control is employed to achieve rapid excursion response and more stable yields. Return on investment analysis optimizes the cost of defect metrology against die cost reduction achieved by higher die yields. |
| File Format | |
| Access Restriction | Open |
| Subject Keyword | Line Defect Monitor Rapid Excursion Response Die Yield Improvement Line Defect Control Problem Resolution Defect Metrology Cost-efficient Manner Shorten Cycle Time Rapid Feedback Stable Yield Good Die Output High-volume Manufacturing Defect Monitor Development Investment Analysis Semiconductor Manufacturing Die Yield Defect Monitor Die Cost Reduction |
| Content Type | Text |
| Resource Type | Article |