NDLI: Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar.

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Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar.

Content Provider	World Health Organization (WHO)-Global Index Medicus
Author	Suzuki, Tsuneo Ito, Haruhiko Araki, Hitoshi Yamamoto, Ayumi Wada, Akira Saitoh, Hidetoshi
Description	Country affiliation: Japan Author Affiliation: Ito H ( Department of Chemistry, Nagaoka University of Technology, Nagaoka, Niigata 940-2188, Japan.)
Abstract	The sticking probability, s, of CN(X(2)Σ(+)) radicals onto amorphous carbon nitride (a-CN(x)) films with high [N]/([N]+[C]) ratios (≤0.5) was evaluated. CN(X(2)Σ(+)) radicals were generated from the decomposition of BrCN with the microwave discharge flow of Ar in the two experimental configurations, I and II, where the distance between the tip of the nozzle introducing BrCN is close (≈10 mm) to and distant (≈0.3 m) from the laser-beam path or the Si substrate, respectively. For each configuration, s was evaluated both under the desiccated and H(2)O-added conditions from the number density of CN(X(2)Σ(+)) evaluated from the intensity of the CN(A(2)Π(i)-X(2)Σ(+)) laser-induced fluorescence spectrum calibrated against Rayleigh scattering intensity of Ar, the flow speed measured by a time-resolved emission, and the film mass. The [N]/([N]+[C]) ratios of films were evaluated as 0.4-0.5 and 0.3 in the configurations I and II, respectively, from the compositional analysis using Rutherford back scattering and elastic recoil detection analysis together with the XPS analysis. The variation of s under various experimental conditions was discussed based on the electron densities in the reaction region and the relative density of the hydrogen-termination structures of the film surface.
ISSN	13861425
Volume Number	86
e-ISSN	18733557
Journal	Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy
Language	English
Publisher	Elsevier
Publisher Date	2012-02-01
Publisher Place	Great Britain (UK)
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Argon Chemistry Bromides Chemistry, Organic Methods Cyanides Free Radicals Microwaves Nitriles Light Scattering, Radiation Spectrophotometry, Infrared Spectrum Analysis, Raman Journal Article Research Support, Non-u.s. Gov't Discipline Spectroscopy
Content Type	Text
Resource Type	Article
Subject	Spectroscopy Atomic and Molecular Physics, and Optics Analytical Chemistry Instrumentation

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