NDLI: Adsorption calorimetry during metal vapor deposition on single crystal surfaces: increased flux, reduced optical radiation, and real-time flux and reflectivity measurements.

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Adsorption calorimetry during metal vapor deposition on single crystal surfaces: increased flux, reduced optical radiation, and real-time flux and reflectivity measurements.

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Adsorption calorimetry during metal vapor deposition on single crystal surfaces: increased flux, reduced optical radiation, and real-time flux and reflectivity measurements.

Content Provider	World Health Organization (WHO)-Global Index Medicus
Author	Hemmingson, Stephanie L. Campbell, Charles T. Sellers, Jason R. V. James, Trevor E. Farmer, Jason A.
Description	Country affiliation: United States Author Affiliation: Sellers JR ( Department of Chemistry, Box 351700, University of Washington, Seattle, Washington 98195-1700, USA.); James TE ( Department of Chemistry, Box 351700, University of Washington, Seattle, Washington 98195-1700, USA.); Hemmingson SL ( Department of Chemistry, Box 351700, University of Washington, Seattle, Washington 98195-1700, USA.); Farmer JA ( Department of Chemistry, Box 351700, University of Washington, Seattle, Washington 98195-1700, USA.); Campbell CT ( Department of Chemistry, Box 351700, University of Washington, Seattle, Washington 98195-1700, USA.)
Abstract	Thin films of metals and other materials are often grown by physical vapor deposition. To understand such processes, it is desirable to measure the adsorption energy of the deposited species as the film grows, especially when grown on single crystal substrates where the structure of the adsorbed species, evolving interface, and thin film are more homogeneous and well-defined in structure. Our group previously described in this journal an adsorption calorimeter capable of such measurements on single-crystal surfaces under the clean conditions of ultrahigh vacuum [J. T. Stuckless, N. A. Frei, and C. T. Campbell, Rev. Sci. Instrum. 69, 2427 (1998)]. Here we describe several improvements to that original design that allow for heat measurements with ~18-fold smaller standard deviation, greater absolute accuracy in energy calibration, and, most importantly, measurements of the adsorption of lower vapor-pressure materials which would have previously been impossible. These improvements are accomplished by: (1) using an electron beam evaporator instead of a Knudsen cell to generate the metal vapor at the source of the pulsed atomic beam, (2) changing the atomic beam design to decrease the relative amount of optical radiation that accompanies evaporation, (3) adding an off-axis quartz crystal microbalance for real-time measurement of the flux of the atomic beam during calorimetry experiments, and (4) adding capabilities for in situ relative diffuse optical reflectivity determinations (necessary for heat signal calibration). These improvements are not limited to adsorption calorimetry during metal deposition, but also could be applied to better study film growth of other elements and even molecular adsorbates.
ISSN	00346748
Issue Number	12
Journal	Review of Scientific Instruments
Volume Number	84
e-ISSN	10897623
Language	English
Publisher	American Institute of Physics
Publisher Date	2013-12-01
Publisher Place	United States
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Discipline Physics Discipline Chemistry
Content Type	Text
Resource Type	Article
Subject	Medicine Instrumentation

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