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| Content Provider | Taylor & Francis Online |
|---|---|
| Author | Cho, H. Kim, H. Y. Miyazaki, S. |
| Abstract | Alloying process and shape memory properties of a Ti/Ni multilayer thin film fabricated by a dual d.c. magnetron sputter–deposition method were investigated, and compared with those of a Ti—Ni amorphous thin film fabricated by an alloy target sputter–deposition method. The multilayer thin film was made by depositing Ti and Ni layers alternately on a SiO2/Si substrate. The Ti and Ni of the Ti/Ni multilayer thin film were crystalline after deposition. Alloying of the Ti/Ni multilayer thin film proceeded in multi steps. Amorphous phase was formed at the interfaces between the Ti and Ni layers by inter-diffusion of the Ti and Ni atoms during heating up to 640 K. Ni-rich Ti–Ni B2 phase was formed during heating up to 710 K. During further heating up to 750 K, the Ni-content of the Ti–Ni B2 phase decreased and Ti2Ni phase was formed. The Ti/Ni multilayer thin film exhibited shape memory effect after heat-treatment at 673 K where Ti–Ni amorphous thin films were not crystallized. The heat-treated Ti/Ni multilayer thin films exhibited the shape memory effect equivalent to that of the heat-treated Ti—Ni amorphous thin films when the heat-treatment temperature was above 873 K. |
| Starting Page | 678 |
| Ending Page | 683 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| ISSN | 14686996 18785514 |
| DOI | 10.1016/j.stam.2005.05.006 |
| Journal | Science and Technology of Advanced Materials |
| Volume Number | 6 |
| Issue Number | 6 |
| Language | English |
| Publisher | Taylor & Francis |
| Publisher Date | 2005-09-12 |
| Access Restriction | Open |
| Subject Keyword | Shape memory alloy Ti–Ni Sputtering Thin film Shape memory effect Multilayer Alloying process |
| Content Type | Text |
| Resource Type | Article |
| Subject | Materials Science |
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