NDLI: Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films

Please wait, while we are loading the content...

Effect of Sintering Atmosphere and Solution Treatment on Density, Microstructure and Tensile Properties of Duplex Stainless Steels Developed from Pre-alloyed Powders

Environmental Benign Process for Production of Molybdenum Metal from Sulphide Based Minerals

Investigating the Utility of Iron Ore Waste in Preparing Non-fired Bricks

Multiplier Accounting of Indian Mining Industry: The Application

Optimization of Friction and Wear Properties of Electroless Ni–P Coatings Under Lubrication Using Grey Fuzzy Logic

Preparation and Characterization of Nateglinide Loaded Hydrophobic Biocompatible Polymer Nanoparticles

Study on Reduction Kinetics of Briquettes of Hematite Fines with Boiler Grade Coal and Coke Dust in Two Different Forms: Intermixing and Multilayered

Tribological Wear Behaviour and Hardness Measurement of SiC, Al$_{2}$O$_{3}$ Reinforced Al. Matrix Hybrid Composite

Prospect of Thermal Insulation by Silica Aerogel: A Brief Review

Journal of The Institution of Engineers (India): Series D : Volume 98, Issue 1, April 2017

Journal of The Institution of Engineers (India): Series D : Volume 97

Journal of The Institution of Engineers (India): Series D : Volume 96

Journal of The Institution of Engineers (India): Series D : Volume 95

Journal of The Institution of Engineers (India): Series D : Volume 94

Journal of The Institution of Engineers (India): Series D : Volume 93

Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films

Content Provider	Springer Nature Link
Author	Sekhar Das, Himadri Das, Rajesh
Copyright Year	2016
Abstract	Transparent conducting ZnO:Al thin films with lowest electrical resistivity and sheet resistance 3.89 × 10$^{−4}$ Ω cm and 7.65 Ω/□ were developed by RF-magnetron sputtering using Ar + H$_{2}$ as sputtering gas at 250 °C. ZnO:Al films are highly polycrystalline hexagonal wurtzite, (002) oriented and grain size are around 30 nm. The highest carrier concentration and mobility of our lab deposited ZnO:Al films are (~10$^{21}$ cm$^{−3}$) and 8.93 cm$^{2}$/V s respectively. RF-sputtered ZnO:Al films are self textured and surface roughness of ZnO:Al films varies with H$_{2}$ dilution ratio and ultimately affects on Haze factor. Haze factor varies from 36 to 42.8 for introducing different gas ambient during deposition. Blue and green photoluminescence emission peaks are observed at 432 nm (2.87 eV) and 541.5 nm (2.29 eV) respectively in H$_{2}$ gas deposited ZnO:Al films. Both ZnO:Al and commercial TCO films have almost similar electrical properties except mobility and visible optical transmittance maxima, but still show 30 % higher optical transmittance at longer wavelength region of solar spectrum and U-type surface morphology. Systematic analysis of different materials properties, elemental analysis and surface texture of non-stoichiometric ZnO:Al films are studied and latest status on electrical, optical as well as morphological studies of magnetron sputtered ZnO:Al films are reported. Finally, the possible solutions for expected outcomes are discussed.
Starting Page	203
Ending Page	210
Page Count	8
File Format	PDF
ISSN	22502122
Journal	Journal of The Institution of Engineers (India): Series D
Volume Number	98
Issue Number	2
e-ISSN	22502130
Language	English
Publisher	Springer India
Publisher Date	2016-09-01
Publisher Place	New Delhi
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Engineering ZnO:Al thin film Magnetron sputtering H$_{2}$ gas Commercial TCO films Surface texture Haze factor Figure of merit
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Metals and Alloys Mechanical Engineering Geotechnical Engineering and Engineering Geology

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Ca-Doped ZnO:Al Thin Films: Synthesis and Characterization

Corrosion Behaviour of Sputtered Alumina Thin Films

Location-Optoelectronic Property Correlation in ZnO:Al Thin Film by RF Magnetron Sputtering and Its Photovoltaic Application

Merits and Demerits of Transparent Conducting Magnetron Sputtered ZnO:Al, ITO and SnO$_{2}$:F Thin Films for Solar Cell Applications

The physical properties of AZO films deposited by RF magnetron sputtering in hydrogen-diluted argon

ZnO:Al Thin Film Gas Sensor for Detection of Ethanol Vapor

CO Sensor Using ZnO Thin Film Derived by RF Magnetron Sputtering Technique

Impact of Ar Flow Rates on Micro-Structural Properties of $WS_{2}$ Thin Film by RF Magnetron Sputtering

Hydrogen influence on gallium arsenide thin films prepared by rf-magnetron sputtering technique

Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films

Similar Documents

Ca-Doped ZnO:Al Thin Films: Synthesis and Characterization

Corrosion Behaviour of Sputtered Alumina Thin Films

Location-Optoelectronic Property Correlation in ZnO:Al Thin Film by RF Magnetron Sputtering and Its Photovoltaic Application

Merits and Demerits of Transparent Conducting Magnetron Sputtered ZnO:Al, ITO and SnO$_{2}$:F Thin Films for Solar Cell Applications

The physical properties of AZO films deposited by RF magnetron sputtering in hydrogen-diluted argon

ZnO:Al Thin Film Gas Sensor for Detection of Ethanol Vapor

CO Sensor Using ZnO Thin Film Derived by RF Magnetron Sputtering Technique

Impact of Ar Flow Rates on Micro-Structural Properties of $WS_{2}$ Thin Film by RF Magnetron Sputtering

Hydrogen influence on gallium arsenide thin films prepared by rf-magnetron sputtering technique

Effect of Hydrogen on the Properties of RF-Magnetron Sputtering ZnO:Al Films as an Alternative to Commercially Available TCO Films