NDLI: Effect of substrate temperature on residual stress of ZnO thin films prepared by ion beam deposition

Content Provider	Springer Nature Link
Author	Jeon, Ju Won Kim, Myoung Jang, Lee Woon Hoffman, J. L. Kim, Nam Soo Lee, In Hwan
Copyright Year	2012
Abstract	We have investigated the effect of substrate temperature on micro-structural properties of ZnO thin films prepared by ion beam deposition technique. ZnO thin films were deposited on AlN-buffered Si (111) and sapphire (001) substrates at various substrate temperatures. The structural properties and surface morphologies were examined by high resolution X-ray diffraction (XRD) and field emission scanning electron microscopy, respectively. The RMS roughness was measured by atomic force microscopy. XRD measurements confirmed that the ZnO thin films were grown well on the AlN-buffered Si (111) and sapphire (001) substrates along the c-axis. Minimization of residual stress was carried out by tuning the substrate temperature. The structural properties were notably improved with increasing substrate temperature.
Starting Page	27
Ending Page	32
Page Count	6
File Format	PDF
ISSN	17388090
Journal	Electronic Materials Letters
Volume Number	8
Issue Number	1
e-ISSN	20936788
Language	English
Publisher	The Korean Institute of Metals and Materials
Publisher Date	2012-03-09
Publisher Place	Springer
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	ZnO thin film ion beam deposition stress substrate temperature Nanotechnology Condensed Matter Physics Optical and Electronic Materials Characterization and Evaluation of Materials Nanotechnology and Microengineering
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials

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