NDLI: Spontaneous Deposition of Iridium onto Nickel Substrates for the Oxygen Evolution Reaction

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Spontaneous Deposition of Iridium onto Nickel Substrates for the Oxygen Evolution Reaction

Content Provider	Springer Nature Link
Author	Mellsop, Sophia R. Gardiner, Alister Marshall, Aaron T.
Copyright Year	2016
Abstract	Spontaneous deposition of Ir onto Ni substrates was investigated as a method to produce electrocatalytic layers for the oxygen evolution reaction in 30 % KOH solution. UV/Vis spectroscopy, cyclic voltammetry and other electrochemical methods are used to investigate the deposition process and the activity of the electrocatalytic coating towards the oxygen evolution reaction. From three solutions (IrCl$_{3}$+HCl, H$_{2}$IrCl$_{6}$+HCl and H$_{2}$IrCl$_{6}$), H$_{2}$IrCl$_{6}$ is shown to give the most active and stable coating, with deposition times of 45 min at 60$^{∘}$C enough to increase the activity of the Ni substrate for the oxygen evolution reaction. It is proposed that Ir deposition can occur via the reduction of the Ir precursor coupled to Ni oxidation, as well as the hydrolysis and localised precipitation of the Ir precursor due to the increase in surface pH during Ni dissolution.
Starting Page	226
Ending Page	234
Page Count	9
File Format	PDF
ISSN	18682529
Journal	Electrocatalysis
Volume Number	7
Issue Number	3
e-ISSN	18685994
Language	English
Publisher	Springer US
Publisher Date	2016-02-05
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Iridium oxide Nickel oxide Oxygen evolution reaction Alkaline water electrolysis Electrocatalysis Electrochemistry Physical Chemistry Catalysis Energy Technology
Content Type	Text
Resource Type	Article
Subject	Electrochemistry

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