NDLI: Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers

Content Provider	Springer Nature Link
Author	Li, Yan Jie, Wanqi Kang, Renke Gao, Hang
Copyright Year	2011
Abstract	The mechanical characters of CdZnTe crystal were investigated by nanoscratch tests, and the effects of mechanical anisotropy on the material removal rate and surface quality were studied by polishing tests. There is a peak of frictional coefficient at the early stage of scratch, and increasing the vertical force will result in the increase of peak value correspondingly. The fluctuation phenomenon of frictional coefficient is generated at high vertical force. The lateral forces show the apparent twofold and threefold symmetries on (110) and (111) planes, respectively. To obtain high surface quality, low polishing pressure and hard direction (〈 $\bar 1$ 10 〉 directions on (110) plane and 〈 11 $\bar 2$ 〉 directions on (111) plane) should be selected, and to achieve high material removal rate, high polishing pressure and soft direction (〈 001 〉 directions on (110) plane and 〈 $\bar 1$ 2 $\bar 1$ 〉 directions on (111) plane) should be selected.
Starting Page	381
Ending Page	386
Page Count	6
File Format	PDF
ISSN	10010521
Journal	Rare Metals
Volume Number	30
Issue Number	4
e-ISSN	18677185
Language	English
Publisher	Nonferrous Metals Society of China
Publisher Date	2011-08-03
Publisher Place	Springer Berlin Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	cadmium compounds single crystals nanoscratch tests frictional coefficient material removal rate surface quality anisotropy Metallic Materials Surfaces and Interfaces, Thin Films Ceramics, Glass, Composites, Natural Methods Nanotechnology Physical Chemistry Inorganic Chemistry
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Metals and Alloys Physical and Theoretical Chemistry Condensed Matter Physics

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