NDLI: Keystone error analysis of projection optics in a maskless lithography system

Content Provider	Springer Nature Link
Author	Kang, Dong Won Kang, Minwook Hahn, Jae Won
Copyright Year	2015
Abstract	In this paper we address keystone error, a significant parameter when diagnosing the misalignment of projection optics in maskless lithography systems. Tilting of either the object or image planes of an optical system results in keystone error. In this experiment, we measure the position of a 15×15 beam spot array with an accuracy of 100 nm. We numerically fit the measured position of the beam spot array into a theoretical model to determine the keystone error of the projection optics in a maskless lithography system. Using this method, we align the optical system to minimize the keystone error to 0.01% with a 1.5×1.5 mm$^{2}$ square object. We also analyze the influence of the keystone error on the stitch error.
Starting Page	373
Ending Page	378
Page Count	6
File Format	PDF
ISSN	22347593
Journal	International Journal of Precision Engineering and Manufacturing
Volume Number	16
Issue Number	2
e-ISSN	20054602
Language	English
Publisher	Korean Society for Precision Engineering
Publisher Date	2015-02-06
Publisher Place	Springer
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Distortion Keystone error Maskless lithography Projection optics Industrial and Production Engineering Materials Science
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Mechanical Engineering Electrical and Electronic Engineering

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Keystone error analysis of projection optics in a maskless lithography system