NDLI: Multidisciplinary optimization of etch process chamber on the basis of MCDM

Content Provider	Springer Nature Link
Author	Duan, Wenrui Tian, Ling Wang, Zhansong Han, Wenbin
Copyright Year	2014
Abstract	A multidisciplinary optimization integrating flow and plasma performance was used to develop an etch process chamber with dualfrequency capacitively coupled plasma. Pressure and ion density characteristics are significantly influenced by structures, such as electrode gap, number of confinement rings, electrode radius, and process conditions of flow rate. This study aims to minimize the objective functions of pressure and ion density simultaneously. Based on flow and plasma simulation, an approximation model is created using quartic response surface method (RSM). A genetic algorithm was utilized to explore Pareto front. The concept of entropy weight is combined with the weight defined in analytic hierarchy process to create a synthetic weight over the objectives. The non-dominated solutions are ranked by the modified technique for order preference by similarity to ideal solution. The ranking list helps arrive at rational decisions and provide a unique solution. The optimum structure of the chamber is obtained and the final solution is discussed. The proposed optimization framework improves the distribution profile of pressure and ion density.
Starting Page	4621
Ending Page	4633
Page Count	13
File Format	PDF
ISSN	1738494X
Journal	Journal of Mechanical Science and Technology
Volume Number	28
Issue Number	11
e-ISSN	19763824
Language	English
Publisher	Korean Society of Mechanical Engineers
Publisher Date	2015-01-22
Publisher Place	Seoul
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	AHP DF CCP Etch Entropy MDO Pareto front Mechanical Engineering Vibration, Dynamical Systems, Control Industrial and Production Engineering
Content Type	Text
Resource Type	Article
Subject	Mechanics of Materials Mechanical Engineering

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