NDLI: Structural modification of tantalum crystal induced by nitrogen ion implantation

Content Provider	Springer Nature Link
Author	RAMEZANI, A H HANTEHZADEH, M R
Copyright Year	2016
Abstract	This paper investigates the effect of nitrogen ion implantation on tantalum surface structure. In this experiment, nitrogen ions which had an energy of 30 keV and doses of 1 × 10$^{17}$ to 10 × 10$^{17}$ ions cm$^{−2}$ were used. X-ray diffraction analysis (XRD) was applied for both the metallic Ta substrate and the study of new structures that have been created through the nitrogen ion implantation. Atomic force microscopy (AFM) was also used to check the roughness variations prior to and also after the implantation phase. The experimental results show the formation of hexagonal tantalum nitride (TaN$_{0.43}$) in addition to the fact that by increasing the ion dose, the nitrogen atoms occupy more interstitial spaces in the target crystal. The nitride phase also seen for 3 × 10$^{17}$ and 5 × 10$^{17}$ ions cm$^{−2}$, while it disappeared for higher dose of 7 × 10$^{17}$ and 1 × 10$^{18}$ ions cm$^{−2}$. The FWHM of the dominant peak of tantalum nitride suggest the growth of the crystallite’s size, which is in agreement with the AFM results of the grains.
Starting Page	633
Ending Page	640
Page Count	8
File Format	PDF
ISSN	02504707
Journal	Bulletin of Materials Science
Volume Number	39
Issue Number	3
e-ISSN	09737669
Language	English
Publisher	Indian Academy of Sciences
Publisher Date	2016-06-08
Publisher Institution	Indian Academy of Sciences
Publisher Place	Bangalore, India
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Ion implantation nitrogen tantalum XRD AFM. Materials Science Engineering
Content Type	Text
Resource Type	Article
Subject	Mechanics of Materials Materials Science

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