NDLI: Reflection z-scan for measuring the nonlinear refractive index of porous silicon

Content Provider	Springer Nature Link
Author	Xiang, Mei Jia, Zhen hong Lv, Xiao yi
Copyright Year	2010
Abstract	An experimental investigation on the nonlinear refractive index of nanoporous silicon at wavelengths of 532 nm and 1064 nm is reported by the reflection z-scan (RZ-scan) method with picosecond pulses. The porous silicon (PS) does not need to be peeled from silicon substrate. The method uses a p-polarized beam with oblique incidence. The modification of the reflected beam intensity gives the information of the surface nonlinear refractive index. The index of porous silicon at 1064 nm is at the same order of magnitude as that obtained by the conventional transmission z-scan technique, and the measured absolute value of nonlinear refractive index n $_{2}$ at 532 nm is two orders of magnitude higher than that at 1064 nm.
Starting Page	226
Ending Page	228
Page Count	3
File Format	PDF
ISSN	16731905
Journal	Optoelectronics Letters
Volume Number	6
Issue Number	3
e-ISSN	19935013
Language	English
Publisher	Tianjin University of Technology
Publisher Date	2010-06-05
Publisher Place	Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Optics, Optoelectronics, Plasmonics and Optical Devices
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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Reflection z-scan for measuring the nonlinear refractive index of porous silicon