NDLI: Influence of a Zwitterionic Surfactant on the Surface Properties of Electroless Ni

Content Provider	Springer Nature Link
Author	Muraliraja, R. Elansezhian, R. Sudagar, J. Raviprakash, A. V.
Copyright Year	2016
Abstract	3-(N,N-Dimethyl myristyl-ammonio) propane sulfonate zwitterionic surfactant (C14-SB) which possessed both positive and negative charges was evaluated in the electroless Ni–P coating process. It was observed that the deposition rate, morphology and microhardness of the deposits were enhanced by the addition of C14-SB surfactant. The excess attractive forces from the negative head of C14-SB were strong enough to draw metallic nickel particles towards the substrate. Ni particles attempting to deposit on the electrolyte container were eliminated by the repulsive force from the positive head of the surfactant monomers. Thus, the deposition rate of the coating process was improved. The surfactant at its critical micelle concentration (CMC) doubles the deposition rate when compared to the substrate without surfactant. In addition, the microhardness of the deposit at the surfactant CMC increased by 62 %. The corrosion rate of the substrate without surfactant was 7.15 mpy, while it was 3.97 mpy for the substrate deposited with C14-SB zwitterionic surfactant at the CMC.
Starting Page	1081
Ending Page	1088
Page Count	8
File Format	PDF
ISSN	10973958
Journal	Journal of Surfactants and Detergents
Volume Number	19
Issue Number	5
e-ISSN	15589293
Language	English
Publisher	Springer Berlin Heidelberg
Publisher Date	2016-07-22
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Electroless Zwitterionic Morphology Deposition rate Roughness Microhardness Corrosion Industrial Chemistry/Chemical Engineering Waste Water Technology Water Pollution Control Water Management Aquatic Pollution Surfaces and Interfaces, Thin Films Polymer Sciences Physical Chemistry
Content Type	Text
Resource Type	Article
Subject	Surfaces, Coatings and Films Physical and Theoretical Chemistry Chemical Engineering

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