NDLI: Influence of ion bombardment on residual stresses in diamond-like carbon films

Content Provider	Springer Nature Link
Author	Karasev, P. A. Podsvirov, O. A. Vigradov, A. Ya. Azarov, A. Yu. Karasev, N. N. Smirv, A. S. Titov, A. I. Korkin, I. V. Poplevkin, S. V.
Copyright Year	2009
Abstract	The dependence of internal residual stresses in thin diamond-like carbon films grown by the PECVD technique on the most important growth parameters such as the power of the exciting RF discharge and the substrate bias potential is considered. The results have shown that the mechanical stresses in films reach the uppermost value of 1.9 GPa at the smallest values of power and potential. The stress decreases with the growth of both parameters and has only a slight dependence on the film thickness in the range 0.1–1 μm. The bombardment of the obtained films by argon ions with energy of 300 keV and phosphorus ions with energy of 200 keV has resulted in the reduction of compressive stress with the ion dose growth down to its inversion. AFM study of the bombarded films has revealed significant changes in their surface morphology.
Starting Page	235
Ending Page	238
Page Count	4
File Format	PDF
ISSN	10274510
Journal	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Volume Number	3
Issue Number	2
e-ISSN	18197094
Language	English
Publisher	SP MAIK Nauka/Interperiodica
Publisher Date	2009-04-29
Publisher Place	Dordrecht
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Surfaces and Interfaces, Thin Films
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Surfaces, Coatings and Films

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