NDLI: Influence of Annealing Temperature on CZTS Thin Film Surface Properties

Content Provider	Springer Nature Link
Author	Feng, Wenmei Han, Junfeng Ge, Jun Peng, Xianglin Liu, Yung Jian, Yu Yuan, Lin Xiong, Xiaolu Cha, Limei Liao, Cheng
Copyright Year	2016
Abstract	In this work, copper zinc tin sulfide (CZTS) films were deposited by direct current sputtering and the samples were annealed in different oven-set temperatures and atmosphere (Ar and H$_{2}$S). The surface evolution was investigated carefully by using scanning electron microscopy (SEM), Raman spectroscopy and x-ray photoelectron spectroscopy. The surface of the as-sputtered precursor contained little Cu and large amounts of Zn and Sn. The metallic precursor was continuous and compact without pinholes or cracks. With the increase of the temperature from room temperature to 250°C, Cu atoms diffused to the film surface to form Cu$_{1−x }$S and covered other compounds. Some small platelets were smaller than 500 nm spreading randomly in the holes of the film surfaces. When the temperature reached 350°C, Zn and Sn atoms began to diffuse to the surface and react with S or Cu$_{1−x }$S. At 400°C, SEM showed the melting of large particles and small particles with a size from 100 nm to 200 nm in the background of the film surface. Excess Zn segregated towards the surface regions and formed ZnS phase on the surface. In addition, the signal of sodium in the CZTS surface was observed above 400°C. At 600°C, a large amount of regular structures with clear edges and corners were observed in the film surface in SEM images. A clear recrystallized process on the surface was assumed from those observations.
Starting Page	288
Ending Page	295
Page Count	8
File Format	PDF
ISSN	03615235
Journal	Journal of Electronic Materials
Volume Number	46
Issue Number	1
e-ISSN	1543186X
Language	English
Publisher	Springer US
Publisher Date	2016-08-30
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	CZTS thin films surface sputtering raman XPS Optical and Electronic Materials Characterization and Evaluation of Materials Electronics and Microelectronics, Instrumentation Solid State Physics
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Electronic, Optical and Magnetic Materials Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering

Post-annealing Effect on Microstructures and Thermoelectric Properties of Bi$_{0.45}$Sb$_{1.55}$Te$_{3}$ Thin Films Deposited by Co-sputtering

Thermoelectric Properties of Cobalt Antimony Thin Films Deposited on Flexible Substrates by Radio Frequency Magnetron Sputtering

Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering

Effect of Post-Deposition Processing on ZnO Thin Films and Devices

Influence of Substrate Temperature on Structural and Thermoelectric Properties of Antimony Telluride Thin Films Fabricated by RF and DC Cosputtering

Effects of Growth Temperature and Annealing on Properties of Zn$_{3}$Sn$_{2}$O$_{7}$ Thin Films and Application in TFTs

Fabrication and Characterization of CZTS Thin Films Prepared by the Sulfurization of RF-Sputtered Stacked Metal Precursors

Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering

Influence of Annealing Temperature on CZTS Thin Film Surface Properties

Similar Documents

Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering

Post-annealing Effect on Microstructures and Thermoelectric Properties of Bi$_{0.45}$Sb$_{1.55}$Te$_{3}$ Thin Films Deposited by Co-sputtering

Thermoelectric Properties of Cobalt Antimony Thin Films Deposited on Flexible Substrates by Radio Frequency Magnetron Sputtering

Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering

Effect of Post-Deposition Processing on ZnO Thin Films and Devices

Influence of Substrate Temperature on Structural and Thermoelectric Properties of Antimony Telluride Thin Films Fabricated by RF and DC Cosputtering

Effects of Growth Temperature and Annealing on Properties of Zn$_{3}$Sn$_{2}$O$_{7}$ Thin Films and Application in TFTs

Fabrication and Characterization of CZTS Thin Films Prepared by the Sulfurization of RF-Sputtered Stacked Metal Precursors

Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering

Influence of Annealing Temperature on CZTS Thin Film Surface Properties