NDLI: Synthesis of TiO$_{2}$ supported on activated carbon by MOCVD: operation parameters study

Content Provider	Springer Nature Link
Author	Zhang, Xing wang Zhou, Ming hua Lei, Le cheng Xu, Su
Copyright Year	2004
Abstract	A novel metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalytic titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g·h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy E $_{a}$ of 51.09 kJ/mol. TiO$_{2}$ existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO$_{2}$ particles, which were mainly in the range of 10–20 nm.
Starting Page	1548
Ending Page	1553
Page Count	6
File Format	PDF
ISSN	1673565X
Journal	Journal of Zhejiang University SCIENCE A
Volume Number	5
Issue Number	12
e-ISSN	18621775
Language	English
Publisher	Zhejiang University Press
Publisher Date	2004-12-01
Publisher Place	Hangzhou
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	MOCVD Supported materials Supersaturation Titanium dioxide Mechanical Engineering Civil Engineering Classical and Continuum Physics Industrial Chemistry/Chemical Engineering
Content Type	Text
Resource Type	Article
Subject	Engineering

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