NDLI: Modeling radiative properties of nanoscale patterned wafers

Content Provider	Springer Nature Link
Author	Wang, AiHua Cai, JiuJu
Copyright Year	2010
Abstract	Temperature nonuniformity in rapid thermal processing of wafers is a critical problem facing the semiconductor industry. One cause of the problem is the nonuniform absorption of thermal radiation in patterned wafers where the optical properties vary across the wafer surface. This paper presents a parametric study of the radiative properties of patterned wafers, considering the effect of temperature, wavelength, and polarization. The finite-difference time-domain (FDTD) method is employed to examine the effect of various trench sizes on the radiative properties via numerically solving the Maxwell equations. The effective medium theory (EMT) is also used to help explain the absorptance prediction. The results show that in the cases with trench size variation, the resonance cavity effect may increase the absorptance as the trench width increases. And in the cases with trench size increasing at several different filling ratios, the absorptance does not change much at small filling ratio. The effects of the resonant cavity, diffraction, wave interferences on the spectral-directional absorptance were also discussed. This work is of great importance for optimization of advanced annealing techniques in semiconductor manufacturing.
Starting Page	352
Ending Page	359
Page Count	8
File Format	PDF
ISSN	16747321
Journal	Science in China Series E: Technological Sciences
Volume Number	53
Issue Number	2
e-ISSN	1862281X
Language	English
Publisher	SP Science in China Press
Publisher Date	2010-02-21
Publisher Place	Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	finite-difference time-domain method effective medium theory radiative property periodic nanostructure Engineering
Content Type	Text
Resource Type	Article
Subject	Engineering Materials Science

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