NDLI: Molecular dynamics study of pattern transfer in nanoimprint lithography

Content Provider	Springer Nature Link
Author	Kang, Ji Hoon Kim, Kwang Seop Kim, Kyung Woong
Copyright Year	2007
Abstract	A molecular dynamics simulations model of nanoimprint lithography (NIL) is proposed in order to study the pattern transfer and its related phenomena. The proposed model is similar to a real NIL process imprinting an α-quartz stamp with a rectangular line pattern into an amorphous poly-(methylmethacrylate) (PMMA) film. The polymer deformation behavior and the adhesion and friction effects between the stamp and the polymer film are investigated and their dependency on the pattern aspect ratio is discussed. Force fields including bond, angle, torsion, van der Waals, and electrostatic potentials are used to describe intermolecular and intramolecular interacting forces. Nosé-Hoover thermostat is used to control the temperature of the polymer film and cell multipole method is adopted to treat long range interactions. The deformation of the polymer film is observed for two stamps having different aspect ratio patterns. The distributions of density and stress in the polymer film are calculated for the detail analysis of deformation behavior. For a high aspect ratio pattern (aspect ratio = 2.5, imprint depth = 8.0 nm), large amount of springback of the residual polymer film is observed, which is mainly due to the residual compressive stress left in the polymer film. However, for a low aspect ratio pattern (aspect ratio = 1.0, imprint depth = 3.0 nm), the springback is not observed. In addition, adhesion and friction forces are obtained by dividing the polymer film into subregions and calculating the interacting force between each subregion and the stamp. While the adhesion force is nearly constant regardless of the pattern aspect ratio, the friction force increases as the pattern aspect ratio grows, so the friction force becomes larger than the adhesion force when the pattern aspect ratio increases.
Starting Page	93
Ending Page	102
Page Count	10
File Format	PDF
ISSN	10238883
Journal	Tribology Letters
Volume Number	25
Issue Number	2
e-ISSN	15732711
Language	English
Publisher	Springer US
Publisher Date	2007-01-05
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	nanoimprint lithography molecular dynamics simulation polymer deformation adhesion friction Nanotechnology Physical Chemistry Theoretical and Applied Mechanics Surfaces and Interfaces, Thin Films Tribology, Corrosion and Coatings
Content Type	Text
Resource Type	Article
Subject	Surfaces, Coatings and Films Mechanics of Materials Mechanical Engineering Surfaces and Interfaces

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