NDLI: Photochemical Removal of Gaseous Elemental Mercury in a Dielectric Barrier Discharge Plasma Reactor

Content Provider	Springer Nature Link
Author	Yang, Hongmin Liu, Hao Wu, Hao Wang, Meng
Copyright Year	2012
Abstract	The plasma process has the potential to serve as a low cost mercury oxidation technology that will facilitate elemental mercury removal in a downstream of Flue Gas Desulfurization system. The performance of the main gas constituents, such as H$_{2}$O, O$_{2}$ and HCl on elemental mercury oxidation under plasma atmosphere was investigated in simulated flue gas. Experiments were carried out in a dielectric barrier discharge reactor operated at 140 °C. Photochemical effects of nanocrystalline titania on oxidation of elemental mercury were also tested. The results indicated that both H$_{2}$O and O$_{2}$ promote the oxidation of elemental mercury significantly. Active radicals generated by ionization, such as O, O$_{2}$ and OH, play the crucial roles in oxidation process. The presence of HCl in N2/O2 stream in plasma system is a very effective way of oxidizing elemental mercury, the nearly complete oxidation of elemental mercury was observed by 4 kV of applied voltage only. The best photocatalytic activity of anatase TiO$_{2}$ which was calcined at 600 °C was found in our tests. Compared with the plasma process alone, the oxidation efficiency increased 18.7–26.3 % with the addition of photocatalyst.
Starting Page	969
Ending Page	977
Page Count	9
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	32
Issue Number	5
e-ISSN	15728986
Language	English
Publisher	Springer US
Publisher Date	2012-07-01
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Oxidation of elemental mercury Dielectric barrier discharge Photocatalyst Nuclear Physics, Heavy Ions, Hadrons Mechanical Engineering Characterization and Evaluation of Materials Mechanics Inorganic Chemistry
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

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