NDLI: Principal Limitations in Homogeneous Gas Phase Chemistry in Non-Thermal Plasmas

Content Provider	Springer Nature Link
Author	Holzer, F. Köhler, R. Roland, U. Stelter, E. Kopinke, F. D.
Copyright Year	2011
Abstract	This study highlights the oxidation of H$_{2}$, CH$_{4}$, and HCl present in the range of some volume percent in a homogeneous O$_{2}$ or air phase in a flow through glass barrier discharge reactor. The oxidation of all three compounds is highly exothermic and exergonic at ambient temperature and proceeds at sufficiently high temperatures as radical chain reaction. The conversion of each compound was below 10% in a non-thermal oxygen plasma under various reaction conditions. Increasing concentrations of H$_{2}$ and CH$_{4}$ above the lower explosion limit did not lead to higher conversion degrees. It is assumed that only initial radical formation by electron impact dissociation and exothermic steps within the chain process run in a sufficiently fast manner at ambient temperature. For endothermic steps within the radical chain, the necessary activation energy is not available and the chain reaction aborts, most likely, after formation of peroxyl (hydro- or methyl-peroxyl) radicals.
Starting Page	307
Ending Page	314
Page Count	8
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	31
Issue Number	2
e-ISSN	15728986
Language	English
Publisher	Springer US
Publisher Date	2011-01-07
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Non-thermal plasma Gas phase oxidation Radical chain reaction Hydrogen Methane Mechanical Engineering Mechanics Inorganic Chemistry Characterization and Evaluation of Materials Nuclear Physics, Heavy Ions, Hadrons
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

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