NDLI: On the Use of Global Kinetics Models for the Investigation of Energy Deposition and Chemistry in RF Argon–Oxygen Plasmas Working in the Torr Regime

Content Provider	Springer Nature Link
Author	Morscheidt, W. Hassouni, K. Bauduin, N. Arefi Khonsari, F. Amouroux, J.
Copyright Year	2003
Abstract	A global plasma model is used to investigate the chemistry and energy deposition in 13.56 MHz radio-frequency capacitively coupled oxygen–argon discharges under conditions usually used for the deposition of tin oxide films. These models are based on the solution of a stationary electron Boltzmann equation coupled to species balance equations including the vibrational kinetics equations of O$_{2}$. The results obtained showed that vibrational non equilibrium of O$_{2}$-molecule is not significant. The dissociation degree of O$_{2}$ was found to be around a few percents and the discharge was often moderately electronegative even for small O$_{2}$ contents in the feed gas. The ionization and energy dissipation mechanisms are mainly governed by the collisional processes involving O$_{2}$ for an oxygen feed gas composition greater than 20%. Results also showed that the predicted densities of the charged species and the electronegative character of the discharge are strongly linked to the assumption made on the homogeneity of the power deposition. On the contrary, the predicted density of O-atom is not sensitive to this assumption.
Starting Page	117
Ending Page	140
Page Count	24
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	23
Issue Number	1
e-ISSN	15728986
Language	English
Publisher	Kluwer Academic Publishers-Plenum Publishers
Publisher Date	2003-01-01
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Inorganic Chemistry Characterization and Evaluation Materials Mechanics Nuclear Physics, Heavy Ions, Hadrons Mechanical Engineering
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

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