NDLI: Experimental Research of OH and N 2 + Spatially Resolved Spectra in a Needle-Plate Pulsed Streamer Discharge

Content Provider	Springer Nature Link
Author	Yang, Guangda Wang, Wenchun Liu, Feng Zheng, Shu
Copyright Year	2008
Abstract	In this study, the spatial distributions of the emission intensity of OH ( $$\hbox{A}^{2}Σ {\rightarrow}\hbox{X}^{2}Π,$$ 0-0) and $$\hbox{N}_{2}^{+} (\hbox{B}^{2}Σ_{\rm u}^{+}\rightarrow \hbox{X}^{2}Σ_{\rm g}^{+},$$ 0-0, 391.4 nm) are investigated in the atmospheric pressure pulsed streamer discharge of H$_{2}$O and N$_{2}$ mixture in a needle-plate reactor configuration. The effects of pulsed peak voltage, pulsed repetition rate, input power, and O$_{2}$ flow rate on the spatial distributions of the emission intensity of OH ( $$\hbox{A}^{2}Σ {\rightarrow}\hbox{X}^{2}Π,$$ 0-0), $$\hbox{N}_{2}^{+} (\hbox{B}^{2}Σ _{\rm u}^{+} \rightarrow \hbox{X}^{2}Σ _{\rm g}^{+},$$ 0-0, 391.4 nm), and the vibrational temperature of N$_{2}$ (C) in the lengthwise direction from needle to plate are attained. It is found that the emission intensities of OH ( $$\hbox{A}^{2}Σ {\rightarrow}\hbox{X}^{2}Π,$$ 0-0) and $$\hbox{N}_{2}^{+} (\hbox{B}^{2}Σ_{\rm u}^{+} \rightarrow \hbox{X}^{2}Σ_{\rm g}^{+},$$ 0-0, 391.4 nm) rise with increasing the pulsed peak voltage, the pulsed repetition rate and the input power, and decrease with increasing O$_{2}$ flow rate. In the direction from needle to plate, the emission intensity of OH ( $$\hbox{A}^{2}Σ {\rightarrow}\hbox{X}^{2}Π,$$ 0-0) decreases firstly, and rises near the plate electrode, while the emission intensity of $$\hbox{N}_{2}^{+}(\hbox{B}^{2}Σ_{\rm u}^{+} \rightarrow \hbox{X}^{2}Σ_{\rm g}^{+},$$ 0-0, 391.4 nm) is nearly constant along the needle to plate direction firstly, and rises sharply near the plate electrode. The vibrational temperature of N$_{2}$ (C) is almost independent of the pulsed peak voltage and the pulsed repetition rate, but rises with increasing the O$_{2}$ flow rate and keeps nearly constant in the lengthwise direction. The main physicochemical processes involved are discussed.
Starting Page	317
Ending Page	330
Page Count	14
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	28
Issue Number	3
e-ISSN	15728986
Language	English
Publisher	Springer US
Publisher Date	2008-02-15
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	OH radicals $$\hbox{N}_{2}^{+}$$ ions Spatially resolved spectra Pulsed streamer discharge Vibrational temperature Nuclear Physics, Heavy Ions, Hadrons Inorganic Chemistry Mechanical Engineering Characterization and Evaluation of Materials Mechanics
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

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