NDLI: Initial Growth of Functional Plasma Polymer Nanofilms

Content Provider	Springer Nature Link
Author	Vandenbossche, Marianne Butron Garcia, Maria Isabel Schütz, Urs Rupper, Patrick Amberg, Martin Hegemann, Dirk
Copyright Year	2016
Abstract	To gain deeper insights into the initial growth mechanism, with respect to functional group density and cross-linking, plasma polymer films (PPFs) were deposited from C$_{2}$H$_{4}$/NH$_{3}$ discharges. Keeping gas phase processes and electrical discharge conditions constant all over the deposition process, the mass deposition rate of the PPF was found to be initially lower and regularly increasing before reaching steady-state conditions after a film thickness of about 5 nm on metal oxide substrates. The first gradient nano-layer, i.e. the first 5 nm deposited, were observed to possess less amino functional groups and to be more cross-linked and thus more stable compared to the film prepared in steady state conditions, in which the uniform film comprises more amino functional groups, yet is less cross-linked and thus less stable. Due to its sticking probability, the substrate thus influences the initial deposition rate. Over plasma exposure time, the substrate becomes covered by an initial layer of PPF and the film-forming species are no longer deposited onto the pristine substrate but onto the already deposited organic polymer film. The preparation of the highly stable functional nanofilm, i.e. the initial PPF layer, can lead to new possible applications and fast deposition processes.
Starting Page	667
Ending Page	677
Page Count	11
File Format	PDF
ISSN	02724324
Journal	Plasma Chemistry and Plasma Processing
Volume Number	36
Issue Number	2
e-ISSN	15728986
Language	English
Publisher	Springer US
Publisher Date	2016-01-07
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Plasma deposition Initial growth Nanofilm Sticking probability Amino group density Inorganic Chemistry Mechanics Characterization and Evaluation of Materials Mechanical Engineering
Content Type	Text
Resource Type	Article
Subject	Chemistry Surfaces, Coatings and Films Condensed Matter Physics Chemical Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Atomized Spray Plasma Deposition of Structurally Well-Defined Bioactive Coatings

Electroluminescence and Photoluminescence of Conjugated Polymer Films Prepared by Plasma Enhanced Chemical Vapor Deposition of Naphthalene

Deposition of Ni Coatings by Electrolytic Plasma Processing

Nanoengineered Plasma Polymer Films for Biomaterial Applications

Cathodic Plasma Electrolysis Processing for Metal Coating Deposition

Molecular Beam Mass Spectrometry System for Characterization of Thermal Plasma Chemical Vapor Deposition

Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors

Deposition of Gallium Nitride Thin Films by MOCVD in Microwave Plasma

Plasma Processing Based Synthesis of Functional Nanocarbons

Initial Growth of Functional Plasma Polymer Nanofilms

Similar Documents

Atomized Spray Plasma Deposition of Structurally Well-Defined Bioactive Coatings

Electroluminescence and Photoluminescence of Conjugated Polymer Films Prepared by Plasma Enhanced Chemical Vapor Deposition of Naphthalene

Deposition of Ni Coatings by Electrolytic Plasma Processing

Nanoengineered Plasma Polymer Films for Biomaterial Applications

Cathodic Plasma Electrolysis Processing for Metal Coating Deposition

Molecular Beam Mass Spectrometry System for Characterization of Thermal Plasma Chemical Vapor Deposition

Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors

Deposition of Gallium Nitride Thin Films by MOCVD in Microwave Plasma

Plasma Processing Based Synthesis of Functional Nanocarbons

Initial Growth of Functional Plasma Polymer Nanofilms