NDLI: Thickness-dependent optical properties of ZnO thin films

Content Provider	Springer Nature Link
Author	Miao, L. Tanemura, S. Tanemura, M. Lau, S. P. Tay, B. K.
Copyright Year	2007
Abstract	Spectroscopic ellipsometry was employed to study the thickness dependence of the optical properties of ZnO thin films. ZnO thin films with a nominal thickness of 100, 200, and 400 nm were deposited by filtered cathodic vacuum arc (FCVA) method. The optical band gap showed a slight blue shift with respect to the bulk value with increasingly thicker ZnO films deposited on Si, while no shift with thickness could be observed for ZnO films deposited on a SiO$_{2}$/Si substrate, indicating a possible effect of the SiO$_{2}$ buffer layer on the film optical properties. The Urbach tail parameter E$_{0}$ increased as the film thickness is increased, indicating a decrease in the structural disorder with increasing film thickness.
Starting Page	343
Ending Page	346
Page Count	4
File Format	PDF
ISSN	09574522
Journal	Journal of Materials Science: Materials in Electronics
Volume Number	18
Issue Number	1
e-ISSN	1573482X
Language	English
Publisher	Springer US
Publisher Date	2007-03-27
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Characterization and Evaluation of Materials Optical and Electronic Materials
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Biomaterials Biophysics Condensed Matter Physics Electronic, Optical and Magnetic Materials Bioengineering Electrical and Electronic Engineering Biomedical Engineering

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Thickness-dependent optical properties of ZnO thin films