NDLI: The effect of heat-treatment on the grain-size of nanodisperse plasmathermal silicon nitride powder

Content Provider	Springer Nature Link
Author	Gubicza, J. Szépvölgyi, J. Mohai, I. Ribárik, G. Ungár, T.
Copyright Year	2000
Abstract	Nanodisperse silicon nitride has been synthesized by vapor phase reaction of silicon tetrachloride and ammonia in a thermal plasma reactor and crystallized at temperatures 1250, 1350, 1450 and 1500°C. The average grain-size and the dislocation density of the samples were determined by the recently developed modified Williamson-Hall and Warren-Averbach procedures from X-ray diffraction profiles. A new numerical method provided log-normal grain-size distributions from the size parameters derived from X-ray diffraction profiles. It has been shown that the average grain-size in the amorphous phase is lower than that observed in the crystalline fraction. On the other hand, the average grain-size in the crystalline fraction decreases up to 1450°C while it increases during heat-treatment at 1500°C. The size distribution and the area-weighted average grain-size obtained by X-rays were in good agreement with those determined by TEM and from the specific surface area, respectively. The dislocation density was found to be of the order of 10$^{14}$ and 10$^{15}$ m$^{−2}$.
Starting Page	3711
Ending Page	3717
Page Count	7
File Format	PDF
ISSN	00222461
Journal	Journal of Materials Science
Volume Number	35
Issue Number	15
e-ISSN	15734803
Language	English
Publisher	Kluwer Academic Publishers
Publisher Date	2000-01-01
Publisher Place	Dordrecht
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Polymer Sciences Industrial Chemistry/Chemical Engineering Characterization and Evaluation Materials Mechanics
Content Type	Text
Resource Type	Article
Subject	Ceramics and Composites Mechanics of Materials Mechanical Engineering Polymers and Plastics

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