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| Content Provider | Springer Nature Link |
|---|---|
| Author | Wang, Changzheng Xu, Dongran Xiao, Xiaoguang Zhang, Yiqing Zhang, Dong |
| Copyright Year | 2007 |
| Abstract | A series of ZnO thin films were deposited on silicon (100) substrate at 473 K by using facing target RF magnetron sputtering system at different oxygen pressure in this paper. The structure, surface morphology and photoluminescence of the ZnO thin films were characterized by X-ray diffraction, atomic force microscopy (AFM), and photoluminescence spectra (PL), respectively. The results showed that only a (002) peak of hexagonal wurtzite appeared in all ZnO thin films, indicating that ZnO films exhibited strong texture. With increasing the oxygen pressure, the results indicated that the ZnO film deposited at 1.2 Pa Ar pressure and 0.6 Pa oxygen pressure had the best preferential C-axis orientation and the weakest compressive stress. Meanwhile, AFM observation showed that ZnO film deposited at pure Ar had the highest surface roughness. With the increment of oxygen pressure, the surface roughness decreased gradually. In addition, PL measurement showed that the ZnO film deposited at 1.2 Pa Ar pressure and 0.6 Pa oxygen pressure had the strongest ultraviolet emission and the weakest blue emission. |
| Starting Page | 9795 |
| Ending Page | 9800 |
| Page Count | 6 |
| File Format | |
| ISSN | 00222461 |
| Journal | Journal of Materials Science |
| Volume Number | 42 |
| Issue Number | 23 |
| e-ISSN | 15734803 |
| Language | English |
| Publisher | Springer US |
| Publisher Date | 2007-08-18 |
| Publisher Place | Boston |
| Access Restriction | One Nation One Subscription (ONOS) |
| Subject Keyword | Mechanics Crystallography Continuum Mechanics and Mechanics of Materials Polymer Sciences Characterization and Evaluation of Materials Materials Science |
| Content Type | Text |
| Resource Type | Article |
| Subject | Ceramics and Composites Mechanics of Materials Mechanical Engineering Polymers and Plastics |
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