NDLI: Synthesis and morphology control of diluted Si nanowire arrays by metal-assisted chemical etching and thermal oxidation based on nanosphere lithography

Content Provider	Springer Nature Link
Author	Zhou, Bukang Li, Xinhua Shi, Tongfei Liu, Guangqiang Cao, Huaxiang Wang, Yuqi
Copyright Year	2017
Abstract	Well-separated silicon nanowires with good periodicity and lower porosity density are fabricated using thermal oxidization and HF acid etching after forming silicon nanowire (Si NW) arrays with high diameter-to-pitch ratio by metal-assisted chemical etching based on nanosphere lithography. The factors responsible for the special morphology features of Si NW during the oxidation process are understood by thermal oxidation process simulation. A high-temperature oxidation process is proposed to facilitate the alleviation of necking and the acceleration of oxidation of NWs. Furthermore, to reduce the tapering trend, an oxygen diffuse barrier layer is proposed to be pre-deposited on the top of Si NWs before the high-temperature thermal oxidation treatment. By using these methods, a periodic array of Si NWs with a large pitch and small diameter is created. This approach can substantially reduce porosities and surface defects on the outer surface of Si NWs.
Starting Page	6449
Ending Page	6458
Page Count	10
File Format	PDF
ISSN	00222461
Journal	Journal of Materials Science
Volume Number	52
Issue Number	11
e-ISSN	15734803
Language	English
Publisher	Springer US
Publisher Date	2017-02-09
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Materials Science Characterization and Evaluation of Materials Polymer Sciences Continuum Mechanics and Mechanics of Materials Crystallography and Scattering Methods Classical Mechanics
Content Type	Text
Resource Type	Article
Subject	Ceramics and Composites Mechanics of Materials Mechanical Engineering Polymers and Plastics

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

On-Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal Oxidation

An effective three-dimensional surface-enhanced Raman scattering substrate based on oblique Si nanowire arrays decorated with Ag nanoparticles

Vertically aligned and ordered ZnO/CdS nanowire arrays for self-powered UV–visible photosensing

Electrical characteristics of Si-nanoparticle/Si-nanowire-based field-effect transistors

Nitridation-assisted Al infiltration for fabricating Al composites

Morphology of ordering Fe-Si alloys

Micropatterning of diamond crystallites via cobalt-catalyzed thermochemical etching

The optical properties of porous silicon produced by metal-assisted anodic etching

Ion-assisted deposition of amorphous PbO layers

Synthesis and morphology control of diluted Si nanowire arrays by metal-assisted chemical etching and thermal oxidation based on nanosphere lithography

Similar Documents

On-Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal Oxidation

An effective three-dimensional surface-enhanced Raman scattering substrate based on oblique Si nanowire arrays decorated with Ag nanoparticles

Vertically aligned and ordered ZnO/CdS nanowire arrays for self-powered UV–visible photosensing

Electrical characteristics of Si-nanoparticle/Si-nanowire-based field-effect transistors

Nitridation-assisted Al infiltration for fabricating Al composites

Morphology of ordering Fe-Si alloys

Micropatterning of diamond crystallites via cobalt-catalyzed thermochemical etching

The optical properties of porous silicon produced by metal-assisted anodic etching

Ion-assisted deposition of amorphous PbO layers

Synthesis and morphology control of diluted Si nanowire arrays by metal-assisted chemical etching and thermal oxidation based on nanosphere lithography