NDLI: Laser Annealing of SiO$_{2}$ Glass with Copper Nanoparticles

Content Provider	Springer Nature Link
Author	Stepav, A. L. Popok, V. N. Odzhaev, V. B.
Copyright Year	2002
Abstract	Composite layers formed in SiO$_{2}$ by implantation of 50‐keV Cu$^{+}$ ions with a dose of 8·10$^{16}$ cm$^{−2}$ at an ion current density of 10 μA/cm$^{2}$ have been investigated. It is shown that ion implantation carried out under the chosen conditions allows one to synthesize copper nanoparticles in the surface region of a dielectric. The exposure of composites to high‐power pulses of an excimer krypton laser at a wavelength in the SiO$_{2}$ transmission region has been investigated. In the absence of effective optical absorption by a glass substrate, the dynamics of the change in the structure of the layer with metallic nanoparticles is determined by the number of laser pulses. It has been established that at the initial stage of pulsed irradiation fragmentation of the largest nanoparticles occurs followed by the inverse process of their agglomeration as a result of slight heating of the glass matrix; further exposure to the laser irradiation leads to an effective accumulation of energy in the particles and, as a consequence, to their melting and dissociation into small clusters and individual atoms.
Starting Page	97
Ending Page	102
Page Count	6
File Format	PDF
ISSN	00219037
Journal	Journal of Applied Spectroscopy
Volume Number	69
Issue Number	1
e-ISSN	15738647
Language	English
Publisher	Kluwer Academic Publishers-Plenum Publishers
Publisher Date	2002-01-01
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Analytical Chemistry Atomic and Molecular Structure and Spectra
Content Type	Text
Resource Type	Article
Subject	Spectroscopy Condensed Matter Physics

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