NDLI: Effect of silicon alloying addition on the corrosion behaviour of aluminium in some aqueous media

Content Provider	Springer Nature Link
Author	Salih, S.A. Gad Allah, A.G. Mazhar, A.A. Tammam, R.H.
Copyright Year	2001
Abstract	The corrosion behaviour of three Al–Si alloys was studied after galvanostatic passivation in 0.1 M sodium tartrate, sulfate and borate solutions using EIS techniques. The degree of passivation depends on the anion type, the degree of polarization and the alloy composition. It was also found that increase in pH led to a decrease in polarization resistance R $_{p}$. The effect of formation voltage, V $_{f}$, on the growth and dissolution kinetics of the oxide grown on the alloys was studied. The polarization resistance value increases as V $_{f}$ increases up to a certain value; above this the R $_{p}$ value decreases. This critical V $_{f}$ depends on the alloy composition and the test solution. The kinetics of oxide layer dissolution in the absence and presence of Cl$^{−}$ ions was also studied. Increase in immersion time leads to a more severe attack by Cl$^{−}$ ions as shown by the decrease in the value of R $_{p}$. At low Cl$^{−}$ ion concentration the value of R $_{p}$ is higher than that in chloride ion free sulfate solutions, because the rate of passive film repair is much higher than that of barrier layer dissolution. However, at high Cl$^{−}$ ion concentration penetration of Cl$^{−}$ through defects in the barrier layer leads to formation of an oxyhalide layer.
Starting Page	1103
Ending Page	1108
Page Count	6
File Format	PDF
ISSN	0021891X
Journal	Journal of Applied Electrochemistry
Volume Number	31
Issue Number	10
e-ISSN	15728838
Language	English
Publisher	Kluwer Academic Publishers
Publisher Date	2001-01-01
Publisher Place	Dordrecht
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Physical Chemistry Industrial Chemistry/Chemical Engineering
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Chemical Engineering Electrochemistry

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