NDLI: Broad beam source of fast atoms produced as a result of charge exchange collisions of ions accelerated between two plasmas

Content Provider	Springer Nature Link
Author	Panin, V. V. Metel, A. S. Melnik, Yu. A. Grigoriev, S. N.
Copyright Year	2009
Abstract	Experimental study of a fast argon atom beam source is carried out and the study results are presented. The source comprises a 90-mm deep and 210-mm in diameter hollow cathode as well as a flat emission grid, both electrodes made of titanium. The study revealed main factors, which influence the zone diameter of homogeneous substrate etching by a broad beam of fast argon atoms, produced as a result of charge exchange collisions of ions, accelerated between a plasma emitter inside the hollow cathode and a secondary plasma in the working vacuum chamber, the plasmas being separated from each other with the grid. It is shown that at a distance from the grid, exceeding the resonant charge exchange length up to 4 times, elastic collisions have no appreciable impact on the spatial distribution of the etching rate in the vacuum chamber. The homogeneous etching zone diameter is mainly influenced by angular characteristics of accelerated particles in the grid plane. At a constant beam power up to 3–5 kW the diameter is rising with a decrease of their energy and with a corresponding increase of the beam current.
Ending Page	608
Page Count	7
Starting Page	602
File Format	PDF
ISSN	00204412
e-ISSN	16083180
Journal	Instruments and Experimental Techniques
Issue Number	4
Volume Number	52
Language	English
Publisher	SP MAIK Nauka/Interperiodica
Publisher Date	2009-07-31
Publisher Place	Dordrecht
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Measurement Science, Instrumentation Physical Chemistry Electrical Engineering
Content Type	Text
Resource Type	Article
Subject	Instrumentation

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