NDLI: Thermophysical Characterization of a CuO Thin Deposit

Content Provider	Springer Nature Link
Author	Battaglia, Jean Luc Kusiak, Andrzej
Copyright Year	2007
Abstract	CuO thin deposits on a tungsten carbide (consisting of 9% cobalt) substrate are obtained by physical vapor deposition (PVD) at ambient temperature. The longitudinal thermal conductivity as well as the thermal contact resistance at the deposit–substrate interface are investigated. A periodic photothermal experiment based on infrared radiometry is implemented. The amplitude between the periodic heat flux applied on the sample and the average temperature on the heated area are measured over a low frequency range. The method does not require the absolute measurement of these two quantities given that the thermal properties of the substrate are known. Scanning electron microscopy observations show strong anisotropy and columnar structure of the deposits. Moreover, the chemical composition of the films is obtained using the Auger technique. Cobalt diffuses from the substrate toward the deposit during the deposition process. It is demonstrated that the measured thermal conductivity of the CuO layer mainly rests on the microstructure of the layer instead of the roughness of the sample.
Starting Page	1563
Ending Page	1577
Page Count	15
File Format	PDF
ISSN	0195928X
Journal	International Journal of Thermophysics
Volume Number	28
Issue Number	5
e-ISSN	15729567
Language	English
Publisher	Springer US
Publisher Date	2007-05-09
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	radiative photothermal experiment thermal contact resistance thermal conductivity thin film Physical Chemistry Industrial Chemistry/Chemical Engineering Mechanics Condensed Matter
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics

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