NDLI: Design and Analysis of Spectrally Selective Patterned Thin-Film Cells

Content Provider	Springer Nature Link
Author	Hajimirza, Shima Howell, John R.
Copyright Year	2013
Abstract	This paper outlines several techniques for systematic and efficient optimization as well as sensitivity assessment to fabrication tolerances of surface texturing patterns in thin film amorphous silicon (a-Si) solar cells. The aim is to achieve maximum absorption enhancement. The joint optimization of several geometrical parameters of a three-dimensional lattice of periodic square silver nanoparticles, and an absorbing thin layer of a-Si, using constrained optimization tools and numerical FDTD simulations is reported. Global and local optimization methods, such as the Broyden–Fletcher–Goldfarb–Shanno quasi-Newton method and simulated annealing, are employed concurrently for solving the inverse near-field radiation problem. The design of the silver-patterned solar panel is optimized to yield maximum average enhancement in photon absorption over the solar spectrum. The optimization techniques are expedited and improved using a novel nonuniform adaptive spectral sampling technique. Furthermore, the sensitivity of the optimally designed parameters of the solar structure is analyzed by postulating a probabilistic model for the errors introduced in the fabrication process. Monte Carlo simulations and unscented transform techniques are used for this purpose.
Starting Page	1930
Ending Page	1952
Page Count	23
File Format	PDF
ISSN	0195928X
Journal	International Journal of Thermophysics
Volume Number	34
Issue Number	10
e-ISSN	15729567
Language	English
Publisher	Springer US
Publisher Date	2013-08-23
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Fabrication error Inverse optimization Sensitivity analysis Thin-film solar cells Condensed Matter Physics Mechanics Industrial Chemistry/Chemical Engineering Physical Chemistry
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics

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