NDLI: The Influence of a Coupling Film on Ultra-Low-Loss Dielectric Measurement Using an Open Resonator

Content Provider	Springer Nature Link
Author	Yu, Guofen Dutta, Jyotsna M. Jones, Charles R. Gao, Yuanci
Copyright Year	2011
Abstract	A Fabry-Perot open resonator excited through a coupling film and loaded with a plane-parallel dielectric plate is analyzed. The eigen equation of the field in the resonator is obtained. The quality factors of the resonator with and without a coupling film are compared. The quality factors of the resonator loaded with a plate that is in resonance and off resonance are also compared. It is shown that the difference in coupling losses between a loaded resonator and an unloaded resonator may strongly affect the accuracy in measuring ultra-low loss dielectric material. Some ways to reduce the influence of coupling loss are discussed. Our experiment results are consistent with the numerical analysis.
Starting Page	935
Ending Page	942
Page Count	8
File Format	PDF
ISSN	18666892
Journal	International Journal of Infrared and Millimeter Waves
Volume Number	32
Issue Number	7
e-ISSN	18666906
Language	English
Publisher	Springer US
Publisher Date	2011-07-06
Publisher Place	Boston
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Open resonator Quality factor Ultra-low loss-tangent measurement Coupling film Electronics and Microelectronics, Instrumentation Electrical Engineering Optics and Electrodynamics
Content Type	Text
Resource Type	Article
Subject	Instrumentation Condensed Matter Physics Electrical and Electronic Engineering Radiation

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The Influence of a Coupling Film on Ultra-Low-Loss Dielectric Measurement Using an Open Resonator