NDLI: Computer simulation of the thermal stability of nickel films on two-layer graphene

Content Provider	Springer Nature Link
Author	Galashev, A. E.
Copyright Year	2014
Abstract	The structure and the dynamic and mechanical properties of monolayer nickel films deposited on two-layer graphene are studied in the temperature range 300 < T < 3300 K by the molecular-dynamics method. A part of the Ni atoms remains on the graphene sheet even at T = 3300 K for both one- and two-sided coatings. The radial distribution functions of the upper and lower metal films differ significantly even at T = 300 K. The temperature dependence of the horizontal and vertical components of the self-diffusion coefficient of a one-sided nickel film exhibits a jump above 1800 K. No similar specific feature was observed for a two-sided coating of graphene with this film. The stress components acting in the nickel-film plane disappear with an increase in temperature for a shorter time in the case of one-sided coating.
Starting Page	633
Ending Page	639
Page Count	7
File Format	PDF
ISSN	0018151X
Journal	High Temperature
Volume Number	52
Issue Number	5
e-ISSN	16083156
Language	English
Publisher	Pleiades Publishing
Publisher Date	2014-10-11
Publisher Place	Moscow
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Atoms and Molecules in Strong Fields, Laser Matter Interaction Materials Science Classical Continuum Physics Physical Chemistry Industrial Chemistry/Chemical Engineering
Content Type	Text
Resource Type	Article
Subject	Engineering Condensed Matter Physics

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Computer simulation of the thermal stability of nickel films on two-layer graphene