NDLI: Investigation of High-Precision Lithography Lens Aberration Measurement Based on Three-Beam Interference Theory: Sensitivity versus Coherent Factor and Variations with Dose and Focus

Content Provider	Springer Nature Link
Author	mura, Hiroshi
Copyright Year	2000
Abstract	The three-beam interference technique with high coherent illumination is considered promising for application to the measurement of lens aberrations due to its ease of use and convertibility of the results to Zernike coefficients. The coefficients widely describing the characteristics of aberrations are crucially important for the prediction of aberration impacts on a specific pattern, and are expected to minimize the impacts. Furthermore, intensive study of the three-beam interference technique is necessary for highly accurate prediction. This paper discusses the expected characteristics of three-beam interference based on theoretical considerations and experimental results. In one experiment, a krypton fluoride excimer laser scanner with a numerical aperture of 0.68 was used. Having practicable highly coherent illumination affects sensitivity in detecting aberrations, and makes results independent of exposure dose and focus. Such characteristics improve repeatability under realistic conditions that the exposure dose is not uniform and the wafer surface is not flat.
Starting Page	525
Ending Page	534
Page Count	10
File Format	PDF
ISSN	13406000
Journal	Optical Review
Volume Number	7
Issue Number	6
e-ISSN	13499432
Language	English
Publisher	Springer-Verlag
Publisher Date	2000-01-01
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	photolithography wavefront aberration Zernike polynomials coherent factor Electromagnetism, Optics and Lasers
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics

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