NDLI: Inhibition of copper corrosion by self-assembled monolayers of triazole derivative in chloride-containing solution

Content Provider	Springer Nature Link
Author	Liang, Chenghao Wang, Peng Wu, Bo Huang, Naibao
Copyright Year	2009
Abstract	The self-assembled monolayers (SAMs) derived from 3-undecane-4-amino-5-mercapto-1,2,4-triazole (UAMT) on copper surface have been characterized by contact angle test, X-ray photoelectron spectroscopy, and electrochemical techniques. It is found that the UAMT molecules can spontaneously adsorb to copper surface to form compact and oriented monolayers, which can prevent the corrosion of copper in chloride-containing solution effectively. The electrochemical measurements prove that the adsorption of UAMT molecules on copper surface typically processes with a two-step adsorption consisting of a fast initial adsorption and a slowly following reorganization in 10−4-M UAMT solution, and the adsorption of UAMT obeys the Langmuir model in the initial adsorption process. Furthermore, the effects of the immersion time, ultrasonic irradiation, and UAMT concentration on the anticorrosion property of SAMs are studied, and the adsorption isotherm of UAMT on copper is followed.
Starting Page	1391
Ending Page	1399
Page Count	9
File Format	PDF
ISSN	14328488
Journal	Journal of Solid State Electrochemistry
Volume Number	14
Issue Number	8
e-ISSN	14330768
Language	English
Publisher	Springer-Verlag
Publisher Date	2009-11-05
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Triazole derivative Inhibition Metals and alloys SAMs Electrical Engineering Condensed Matter Physics Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Analytical Chemistry Physical Chemistry
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Materials Science Electrical and Electronic Engineering Electrochemistry

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