NDLI: Electrochemical behavior of passive films on Al–17Si–14Mg (wt.%) alloy in near-neutral solutions

Content Provider	Springer Nature Link
Author	Coral Escobar, E. E. Pech Canul, M. A. Pech Canul, M. I.
Copyright Year	2009
Abstract	The anodic polarization behavior of alloy Al–17Si–14Mg in borate solutions with and without 0.01 M NaCl was compared to that for pure Al. Results showed that, for the alloy, the passive current density increased but the pitting susceptibility decreased. The first effect was ascribed to a significant electrochemical activity of the Mg2Si intermetallics and the second to improved stability of the oxide film. X-ray photoelectron spectroscopy analysis of potentiostatically formed passive film on the alloy showed that it consisted of aluminum oxyhydroxide with incorporation of silicon in its elemental and two oxidized states (+3 and +4). Mott–Schottky analysis showed that trivalent silicon ion acted as an n-type dopant in the film. The interrelationship between passive film composition, electronic properties, and pitting behavior has been discussed.
Starting Page	803
Ending Page	810
Page Count	8
File Format	PDF
ISSN	14328488
Journal	Journal of Solid State Electrochemistry
Volume Number	14
Issue Number	5
e-ISSN	14330768
Language	English
Publisher	Springer-Verlag
Publisher Date	2009-05-12
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Pitting susceptibility Alloying element Silicon dopant Electronic properties Electrical Engineering Condensed Matter Physics Characterization and Evaluation of Materials Industrial Chemistry/Chemical Engineering Analytical Chemistry Physical Chemistry
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Materials Science Electrical and Electronic Engineering Electrochemistry

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