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| Content Provider | Springer Nature Link |
|---|---|
| Author | Griffiths, S. K. Ting, A. |
| Copyright Year | 2002 |
| Abstract | Fluorescence radiation during LIGA X-ray exposure and the impact of the resulting secondary dose on feature sidewall tolerances are examined using numerical methods. The study addresses fluorescence emitted by the substrate of the PMMA resist and focuses on the tolerances obtained for resists patterned with a range of feature sizes. New models of the secondary dose and subsequent feature development are presented and discussed. These models are coupled such that the evolving feature geometry during development depends on the local total dose, as well as the development temperature and the transport of PMMA fragments away from the dissolution front. We find that sidewall tolerances for typical exposure and development conditions are less than 0.1 micron for a metallized silicon substrate, but exceed several microns for thick titanium, copper and nickel substrates. We also find that these tolerances are very sensitive to the feature geometry, development temperature and the magnitude of the primary dose. |
| Starting Page | 120 |
| Ending Page | 128 |
| Page Count | 9 |
| File Format | |
| ISSN | 09467076 |
| Journal | Microsystem Technologies |
| Volume Number | 8 |
| Issue Number | 2-3 |
| e-ISSN | 14321858 |
| Language | English |
| Publisher | Springer-Verlag |
| Publisher Date | 2002-05-01 |
| Publisher Place | Berlin, Heidelberg |
| Access Restriction | One Nation One Subscription (ONOS) |
| Content Type | Text |
| Resource Type | Article |
| Subject | Nanoscience and Nanotechnology Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Hardware and Architecture |
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