NDLI: Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography

Content Provider	Springer Nature Link
Author	Liu, Jing Zhang, Weiwei Chang, Guangcai Yi, Futing
Copyright Year	2017
Abstract	Nickel high energy X-ray compound kinoform lenses were fabricated by X-ray lithography technology at Beijing Synchrotron Radiation Facility. The nickel compound refractive lenses aim at focusing X-ray with 50 keV and the designed smallest width of the tooth-like segment is 2.5 μm. To keep the best morphology of the element, Au masks were made twice, whose thickness gradually increased. The fabrication process of compound lenses consists of three parts in general, including the intermediate mask (1.2 μm thick Au pattern) fabrication, the working mask (12 μm thick Au pattern) fabrication and the 300 μm high lenses fabrication. The intermediate mask was made by UV lithography (UV sample) and electron beam direct write lithography (EBDW sample) for comparison, and the EBDW sample had a better morphology than the UV sample at each step. Both samples were tested using the knife-edge scan method at BL13W1 beamline in Shanghai Synchrotron Radiation Facility, which provided the focal widths of 9.2 and 10.4 μm, and the photon flux gains of 6.9 and 5.4 for the EBDW and UV samples at an X-ray energy with 50 keV, respectively.
Starting Page	1553
Ending Page	1562
Page Count	10
File Format	PDF
ISSN	09467076
Journal	Microsystem Technologies
Volume Number	23
Issue Number	5
e-ISSN	14321858
Language	English
Publisher	Springer Berlin Heidelberg
Publisher Date	2017-02-01
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Electronics and Microelectronics, Instrumentation Nanotechnology Mechanical Engineering
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Hardware and Architecture

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Fabrication and performance of 2-D compound X-ray refractive lenses

Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Fabrication of micro pore optics with smooth sidewall using X-ray lithography

Reflectivity test of X-ray mirrors for deep X-ray lithography

Development of high aspect ratio X-ray parabolic compound refractive lens at Indus-2 using X-ray lithography

Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

Submicron polymer structures with X-ray lithography and hot embossing

Cylindrical coils created with 3D X-ray lithography and metallization

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography

Similar Documents

Fabrication and performance of 2-D compound X-ray refractive lenses

Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Fabrication of micro pore optics with smooth sidewall using X-ray lithography

Reflectivity test of X-ray mirrors for deep X-ray lithography

Development of high aspect ratio X-ray parabolic compound refractive lens at Indus-2 using X-ray lithography

Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

Submicron polymer structures with X-ray lithography and hot embossing

Cylindrical coils created with 3D X-ray lithography and metallization

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

Fabrication of high energy X-ray compound kinoform lenses using X-ray lithography